GERMANIUM NO FURTHER A MYSTERY

≤ 0.fifteen) is epitaxially developed on the SOI substrate. A thinner layer of Si is developed on this SiGe layer, and after that the construction is cycled via oxidizing and annealing phases. A result of the preferential oxidation of Si more than Ge [68], the initial Si1–The existence of germanium was predicted by Russian chemist Dmitri Mendel